硅羟基结构检测标准，硅羟基结构检测标准标准内容,检测中心-北检（北京）检测技术研究院

HG/T 6157-2023

α,ω-二羟基聚二甲基硅氧烷线性体

【发布单位或类别】 CN-HG行业标准-化工
【发布日期】2023-04-21
【CCS分类】G17一般有机化工原料
【ICS分类】71.080.99其他有机化学品

HG/T 6157-2023

微机电系统（MEMS）技术硅基MEMS微结构弯曲强度试验方法
Micro-electromechanical systems（MEMS）technology—Bending strength test method for microstructures of silicon based MEMS

【发布单位或类别】 CN-GB国家标准
【发布日期】2023-08-06
【CCS分类】L59微型组件
【ICS分类】31.200集成电路、微电子学

HG/T 6157-2023

微机电系统（MEMS）技术硅基MEMS纳尺度结构冲击试验方法
Micro-electromechanical systems（MEMS） technology—Impact test method for nanostructures of silicon based MEMS

【发布单位或类别】 CN-GB国家标准
【发布日期】2023-08-06
【CCS分类】L59微型组件
【ICS分类】31.200集成电路、微电子学

HG/T 6157-2023

硅羟基磁珠的生产与质量控制

【发布单位或类别】 CN-TUANTI团体标准
【发布日期】2023-03-25
【CCS分类】一般有机化工原料
【ICS分类】11.040.01医疗设备综合

HG/T 6157-2023

羟基封端聚二甲基硅氧烷线性体

【发布单位或类别】 CN-TUANTI团体标准
【发布日期】2019-04-01
【CCS分类】G17粘结材料
【ICS分类】71.080.99其他有机化学品

HG/T 6157-2023

建筑用硅铜结构密封胶
Structural silicone sealants for building

【发布单位或类别】 CN-GB国家标准
【发布日期】1997-05-15
【CCS分类】Q27合成树脂、塑料
【ICS分类】91.100.50粘合料、密封材料

HG/T 6157-2023

气相二氧化硅表面硅羟基含量测试方法

【发布单位或类别】 CN-TUANTI团体标准
【发布日期】2020-04-30
【CCS分类】G32合成材料
【ICS分类】83.020橡胶和塑料工业的生产工艺

HG/T 6157-2023

Гидроксиапатит наноструктурированный. Технические условия
Hydroxyapatite nanostructured. Specifications

【发布单位或类别】 RU-GOST俄罗斯国家标准
【发布日期】
【CCS分类】G30/39建材
【ICS分类】83.120增强塑料

HG/T 6157-2023

建筑围护结构用涂装铝镁硅合金板

【发布单位或类别】 CN-TUANTI团体标准
【发布日期】2020-10-12
【CCS分类】Q建筑构配件与设备综合
【ICS分类】91.060.01建筑构件综合

HG/T 6157-2023

微机电系统（MEMS）技术硅通孔三维结构可靠性评价要求
Micro-electromechanical systems technology（MEMS） — Requirements for reliability Evaluation of Three-dimensional Structure with Through-Silicon Vias

【发布单位或类别】 CN-PLAN国家标准计划
【发布日期】2024-06-28
【CCS分类】能源、核技术
【ICS分类】31.200集成电路、微电子学

HG/T 6157-2023

金属结构曲面屋顶晶硅组件建筑光伏一体化技术规范

【发布单位或类别】 CN-TUANTI团体标准
【发布日期】2024-08-01
【CCS分类】Q70
【ICS分类】91.090外围建筑物

HG/T 6157-2023

Semiconductor devices - Micro-electromechanical devices - Part 47: Silicon based MEMS fabrication technology - Measurement method of bending strength of microstructures
Semiconductor devices - Micro-electromechanical devices - Part 47: Silicon based MEMS fabrication technology - Measurement method of bending strength of microstructures

【发布单位或类别】 IX-IEC国际电工委员会
【发布日期】2024-08-23
【CCS分类】
【ICS分类】31.080.99其他半导体分立器件

HG/T 6157-2023

晶体硅光伏组件与压型钢板一体化构件第1部分：硅酮结构密封胶连接方式

【发布单位或类别】 CN-TUANTI团体标准
【发布日期】2023-11-17
【CCS分类】F
【ICS分类】27.160太阳能工程

HG/T 6157-2023

Standard Guide for Identification of Structures and Contaminants Seen on Specular Silicon Surfaces
Standard Guide for Identification of Structures and Contaminants Seen on Specular Silicon Surfaces

【发布单位或类别】 US-ASTM美国材料与试验协会
【发布日期】2001-01-10
【CCS分类】
【ICS分类】17.040.20表面特征

HG/T 6157-2023

Draft Document - Application of building products in structures - Part 107: Silica fume according to DIN EN 13263-1:2005-10
Draft Document - Application of building products in structures - Part 107: Silica fume according to DIN EN 13263-1:2005-10

【发布单位或类别】 DE-DIN德国标准化学会
【发布日期】2006-03-01
【CCS分类】
【ICS分类】表面特征

HG/T 6157-2023

Standard Guide for Identification of Structures and Contaminants Seen on Specular Silicon Surfaces (Withdrawn 2003)
Standard Guide for Identification of Structures and Contaminants Seen on Specular Silicon Surfaces (Withdrawn 2003)

【发布单位或类别】 US-ASTM美国材料与试验协会
【发布日期】2001-01-10
【CCS分类】
【ICS分类】17.040.20半导体材料

HG/T 6157-2023

Standard Guide for Selection and Use of Etching Solutions to Delineate Structural Defects in Silicon
Standard Guide for Selection and Use of Etching Solutions to Delineate Structural Defects in Silicon

【发布单位或类别】 US-ASTM美国材料与试验协会
【发布日期】1997-06-10
【CCS分类】
【ICS分类】29.045半导体材料

HG/T 6157-2023

Standard Guide for Selection and Use of Etching Solutions to Delineate Structural Defects in Silicon (Withdrawn 2003)
Standard Guide for Selection and Use of Etching Solutions to Delineate Structural Defects in Silicon (Withdrawn 2003)

【发布单位或类别】 US-ASTM美国材料与试验协会
【发布日期】2002-12-10
【CCS分类】
【ICS分类】29.045电容器综合

HG/T 6157-2023

Standard Test Method for Characterization of Metal-Oxide-Silicon (MOS) Structures by Capacitance-Voltage Measurements
Standard Test Method for Characterization of Metal-Oxide-Silicon (MOS) Structures by Capacitance-Voltage Measurements

【发布单位或类别】 US-ASTM美国材料与试验协会
【发布日期】1992-01-01
【CCS分类】
【ICS分类】

HG/T 6157-2023

Standard Test Method for Characterization of Metal-Oxide-Silicon (MOS) Structures by Capacitance-Voltage Measurements (Withdrawn 2003)
Standard Test Method for Characterization of Metal-Oxide-Silicon (MOS) Structures by Capacitance-Voltage Measurements (Withdrawn 2003)

【发布单位或类别】 US-ASTM美国材料与试验协会
【发布日期】1992-05-15
【CCS分类】
【ICS分类】31.060.01

硅羟基结构检测标准

α,ω-二羟基聚二甲基硅氧烷线性体

微机电系统（MEMS）技术 硅基MEMS微结构弯曲强度试验方法 Micro-electromechanical systems（MEMS）technology—Bending strength test method for microstructures of silicon based MEMS

微机电系统（MEMS）技术 硅基MEMS纳尺度结构冲击试验方法 Micro-electromechanical systems（MEMS） technology—Impact test method for nanostructures of silicon based MEMS

硅羟基磁珠的生产与质量控制

羟基封端聚二甲基硅氧烷线性体

建筑用硅铜结构密封胶 Structural silicone sealants for building

气相二氧化硅表面硅羟基含量测试方法

Гидроксиапатит наноструктурированный. Технические условия Hydroxyapatite nanostructured. Specifications

建筑围护结构用涂装铝镁硅合金板

微机电系统（MEMS）技术 硅通孔三维结构可靠性评价要求 Micro-electromechanical systems technology（MEMS） — Requirements for reliability Evaluation of Three-dimensional Structure with Through-Silicon Vias

金属结构曲面屋顶晶硅组件建筑光伏一体化技术规范

晶体硅光伏组件与压型钢板一体化构件 第1部分：硅酮结构密封胶连接方式

Standard Guide for Identification of Structures and Contaminants Seen on Specular Silicon Surfaces Standard Guide for Identification of Structures and Contaminants Seen on Specular Silicon Surfaces

Draft Document - Application of building products in structures - Part 107: Silica fume according to DIN EN 13263-1:2005-10 Draft Document - Application of building products in structures - Part 107: Silica fume according to DIN EN 13263-1:2005-10

Standard Guide for Identification of Structures and Contaminants Seen on Specular Silicon Surfaces (Withdrawn 2003) Standard Guide for Identification of Structures and Contaminants Seen on Specular Silicon Surfaces (Withdrawn 2003)

Standard Guide for Selection and Use of Etching Solutions to Delineate Structural Defects in Silicon Standard Guide for Selection and Use of Etching Solutions to Delineate Structural Defects in Silicon

Standard Guide for Selection and Use of Etching Solutions to Delineate Structural Defects in Silicon (Withdrawn 2003) Standard Guide for Selection and Use of Etching Solutions to Delineate Structural Defects in Silicon (Withdrawn 2003)

Standard Test Method for Characterization of Metal-Oxide-Silicon (MOS) Structures by Capacitance-Voltage Measurements Standard Test Method for Characterization of Metal-Oxide-Silicon (MOS) Structures by Capacitance-Voltage Measurements

Standard Test Method for Characterization of Metal-Oxide-Silicon (MOS) Structures by Capacitance-Voltage Measurements (Withdrawn 2003) Standard Test Method for Characterization of Metal-Oxide-Silicon (MOS) Structures by Capacitance-Voltage Measurements (Withdrawn 2003)

北检院部分仪器展示

微机电系统（MEMS）技术硅基MEMS微结构弯曲强度试验方法
Micro-electromechanical systems（MEMS）technology—Bending strength test method for microstructures of silicon based MEMS

微机电系统（MEMS）技术硅基MEMS纳尺度结构冲击试验方法
Micro-electromechanical systems（MEMS） technology—Impact test method for nanostructures of silicon based MEMS

建筑用硅铜结构密封胶
Structural silicone sealants for building

Гидроксиапатит наноструктурированный. Технические условия
Hydroxyapatite nanostructured. Specifications

微机电系统（MEMS）技术硅通孔三维结构可靠性评价要求
Micro-electromechanical systems technology（MEMS） — Requirements for reliability Evaluation of Three-dimensional Structure with Through-Silicon Vias

晶体硅光伏组件与压型钢板一体化构件第1部分：硅酮结构密封胶连接方式

Standard Guide for Identification of Structures and Contaminants Seen on Specular Silicon Surfaces
Standard Guide for Identification of Structures and Contaminants Seen on Specular Silicon Surfaces

Draft Document - Application of building products in structures - Part 107: Silica fume according to DIN EN 13263-1:2005-10
Draft Document - Application of building products in structures - Part 107: Silica fume according to DIN EN 13263-1:2005-10

Standard Guide for Identification of Structures and Contaminants Seen on Specular Silicon Surfaces (Withdrawn 2003)
Standard Guide for Identification of Structures and Contaminants Seen on Specular Silicon Surfaces (Withdrawn 2003)

Standard Guide for Selection and Use of Etching Solutions to Delineate Structural Defects in Silicon
Standard Guide for Selection and Use of Etching Solutions to Delineate Structural Defects in Silicon

Standard Guide for Selection and Use of Etching Solutions to Delineate Structural Defects in Silicon (Withdrawn 2003)
Standard Guide for Selection and Use of Etching Solutions to Delineate Structural Defects in Silicon (Withdrawn 2003)

Standard Test Method for Characterization of Metal-Oxide-Silicon (MOS) Structures by Capacitance-Voltage Measurements
Standard Test Method for Characterization of Metal-Oxide-Silicon (MOS) Structures by Capacitance-Voltage Measurements

Standard Test Method for Characterization of Metal-Oxide-Silicon (MOS) Structures by Capacitance-Voltage Measurements (Withdrawn 2003)
Standard Test Method for Characterization of Metal-Oxide-Silicon (MOS) Structures by Capacitance-Voltage Measurements (Withdrawn 2003)