硅基氧化到羟基检测标准，硅基氧化到羟基检测标准标准内容,检测中心-北检（北京）检测技术研究院

GB/T 28275-2012

硅基MEMS制造技术氢氧化钾腐蚀工艺规范
Silicon-based MEMS fabrication technology - Specification for KOH etch process

【发布单位或类别】 CN-GB国家标准
【发布日期】2012-05-11
【CCS分类】L55微电路综合
【ICS分类】31.200集成电路、微电子学

GB/T 28275-2012

气相二氧化硅表面硅羟基含量测试方法

【发布单位或类别】 CN-TUANTI团体标准
【发布日期】2020-04-30
【CCS分类】G32合成树脂、塑料
【ICS分类】83.020橡胶和塑料工业的生产工艺

GB/T 28275-2012

Oxidation of MIB and Geosmin by Ozone and Hydroxyl Radicals
Oxidation of MIB and Geosmin by Ozone and Hydroxyl Radicals

【发布单位或类别】 US-AWWA美国给水工程协会
【发布日期】2003-11-02
【CCS分类】微电路综合
【ICS分类】水的化学物质检验

GB/T 28275-2012

Water quality — Determination of total organic carbon (TOC), dissolved organic carbon (DOC), total bound nitrogen (TNb), dissolved bound nitrogen (DNb), total bound phosphorus (TPb) and dissolved bound phosphorus (DPb) after wet chemical catalysed ozone hydroxyl radical oxidation (COHR)
Water quality — Determination of total organic carbon (TOC), dissolved organic carbon (DOC), total bound nitrogen (TNb), dissolved bound nitrogen (DNb), total bound phosphorus (TPb) and dissolved bound phosphorus (DPb) after wet chemical catalysed ozone hydroxyl radical oxidation (COHR)

【发布单位或类别】 IX-ISO国际标准化组织
【发布日期】2020-09-02
【CCS分类】微电路综合
【ICS分类】13.060.50颜料和填充剂

GB/T 28275-2012

Intermediates of Cyanobacterial Toxins with Hydroxyl-Radical Based Advanced Oxidation Technologies (HR-AOTs)
Intermediates of Cyanobacterial Toxins with Hydroxyl-Radical Based Advanced Oxidation Technologies (HR-AOTs)

【发布单位或类别】 US-AWWA美国给水工程协会
【发布日期】2008-11-01
【CCS分类】温度与压力仪表
【ICS分类】水的化学物质检验

GB/T 28275-2012

Journal AWWA - Technical Note: Does Hydroxyl Radical Oxidize Bromide to Bromate
Journal AWWA - Technical Note: Does Hydroxyl Radical Oxidize Bromide to Bromate

【发布单位或类别】 US-AWWA美国给水工程协会
【发布日期】1997-06-01
【CCS分类】口腔科器械、设备与材料
【ICS分类】化学分析

GB/T 28275-2012

Water Quality Factors Affecting Hydroxyl Radicals and Bromate Formation During Ozonation
Water Quality Factors Affecting Hydroxyl Radicals and Bromate Formation During Ozonation

【发布单位或类别】 US-AWWA美国给水工程协会
【发布日期】2003-11-02
【CCS分类】水处理剂
【ICS分类】集成电路、微电子学

GB/T 28275-2012

Determination of the silanol group content on the surface of fumed silica — Reaction gas chromatographic method
Determination of the silanol group content on the surface of fumed silica — Reaction gas chromatographic method

【发布单位或类别】 IX-ISO国际标准化组织
【发布日期】2021-07-13
【CCS分类】一般有机化工原料
【ICS分类】87.060.10集成电路、微电子学

GB/T 28275-2012

Standard Test Method for Total Organic Carbon in Water by Two Stage Wet Chemical Catalyzed Hydroxyl Radical Oxidation with Infra-Red Detection of Resulting Carbon Dioxide
Standard Test Method for Total Organic Carbon in Water by Two Stage Wet Chemical Catalyzed Hydroxyl Radical Oxidation with Infra-Red Detection of Resulting Carbon Dioxide

【发布单位或类别】 US-ASTM美国材料与试验协会
【发布日期】2020-12-01
【CCS分类】微电路综合
【ICS分类】13.060.50力、重力和压力的测量

GB/T 28275-2012

Standard Test Method for Hydroxyl Groups Using Reaction with
Standard Test Method for Hydroxyl Groups Using Reaction with

【发布单位或类别】 US-ASTM美国材料与试验协会

【发布日期】2023-04-01

【CCS分类】半金属及半导体材料分析方法

【ICS分类】71.040.40牙科材料

GB/T 28275-2012

硅基MEMS制造技术体硅溶片工艺规范
Silicon-based MEMS fabrication technology - Specification for the dissolved wafer process

【发布单位或类别】 CN-GB国家标准

【发布日期】2012-05-11

【CCS分类】L55半金属及半导体材料分析方法

【ICS分类】31.200其他化工产品

GB/T 28275-2012

硅基MEMS制造技术体硅压阻加工工艺规范
Silicon-based MEMS fabrication technology—Specification for criterion of the bulk silicon piezoresistance process

【发布单位或类别】 CN-GB国家标准

【发布日期】2016-08-29

【CCS分类】L55水处理剂基础标准与通用方法

【ICS分类】31.200其他有机化学品

GB/T 28275-2012

硅基压力传感器
Silicon-based pressure sensors

【发布单位或类别】 CN-GB国家标准

【发布日期】2012-11-05

【CCS分类】N11

【ICS分类】17.100集成电路、微电子学

GB/T 28275-2012

等离子喷涂羟基磷灰石涂层钛基牙种植体
Plasma sprayed hydroxyapatite coated titanium dental implant

【发布单位或类别】 CN-YY行业标准-医药

【发布日期】2023-09-05

【CCS分类】C33

【ICS分类】11.060.10金属材料试验

GB/T 28275-2012

水处理剂　2-羟基膦酰基乙酸(HPAA)

【发布单位或类别】 CN-HG行业标准-化工

【发布日期】2021-12-02

【CCS分类】G77

【ICS分类】71.100.99金属材料试验

GB/T 28275-2012

α,ω-二羟基聚二甲基硅氧烷线性体

【发布单位或类别】 CN-HG行业标准-化工

【发布日期】2023-04-21

【CCS分类】G17

【ICS分类】71.080.99其他化工产品

GB/T 28275-2012

硅基MEMS制造技术版图设计基本规则
Silicon-based MEMS fabrication technology - The basic regulation of layout design

【发布单位或类别】 CN-GB国家标准

【发布日期】2012-05-11

【CCS分类】L55

【ICS分类】31.200

GB/T 28275-2012

硅多晶气氛区熔基磷检验方法
Test method for phosphorus content in polycrystalline silicon by zone-melting method under controlled atmosphere

【发布单位或类别】 CN-GB国家标准

【发布日期】2018-12-28

【CCS分类】H17

【ICS分类】77.040

GB/T 28275-2012

硅多晶真空区熔基硼检验方法
Test method for boron content in polycrystalline silicon by vacuum zone-melting method

【发布单位或类别】 CN-GB国家标准

【发布日期】2018-09-17

【CCS分类】H17

【ICS分类】77.040

GB/T 28275-2012

水处理剂 2-羟基膦酰基乙酸（HPAA）
Water treatment chemicals:2-Hydroxyphosphonoacetic acid

【发布单位或类别】 CN-HG行业标准-化工

【发布日期】2007-04-13

【CCS分类】G76

【ICS分类】71.100.99

北检院部分仪器展示

硅基氧化到羟基检测标准

硅基MEMS制造技术氢氧化钾腐蚀工艺规范
Silicon-based MEMS fabrication technology - Specification for KOH etch process

气相二氧化硅表面硅羟基含量测试方法

Oxidation of MIB and Geosmin by Ozone and Hydroxyl Radicals
Oxidation of MIB and Geosmin by Ozone and Hydroxyl Radicals

Intermediates of Cyanobacterial Toxins with Hydroxyl-Radical Based Advanced Oxidation Technologies (HR-AOTs)
Intermediates of Cyanobacterial Toxins with Hydroxyl-Radical Based Advanced Oxidation Technologies (HR-AOTs)

Journal AWWA - Technical Note: Does Hydroxyl Radical Oxidize Bromide to Bromate
Journal AWWA - Technical Note: Does Hydroxyl Radical Oxidize Bromide to Bromate

Water Quality Factors Affecting Hydroxyl Radicals and Bromate Formation During Ozonation
Water Quality Factors Affecting Hydroxyl Radicals and Bromate Formation During Ozonation

Determination of the silanol group content on the surface of fumed silica — Reaction gas chromatographic method
Determination of the silanol group content on the surface of fumed silica — Reaction gas chromatographic method

Standard Test Method for Hydroxyl Groups Using Reaction with
Standard Test Method for Hydroxyl Groups Using Reaction with

硅基MEMS制造技术体硅溶片工艺规范
Silicon-based MEMS fabrication technology - Specification for the dissolved wafer process

硅基MEMS制造技术体硅压阻加工工艺规范
Silicon-based MEMS fabrication technology—Specification for criterion of the bulk silicon piezoresistance process

硅基压力传感器
Silicon-based pressure sensors

等离子喷涂羟基磷灰石涂层钛基牙种植体
Plasma sprayed hydroxyapatite coated titanium dental implant

水处理剂　2-羟基膦酰基乙酸(HPAA)

α,ω-二羟基聚二甲基硅氧烷线性体

硅基MEMS制造技术版图设计基本规则
Silicon-based MEMS fabrication technology - The basic regulation of layout design

硅多晶气氛区熔基磷检验方法
Test method for phosphorus content in polycrystalline silicon by zone-melting method under controlled atmosphere

硅多晶真空区熔基硼检验方法
Test method for boron content in polycrystalline silicon by vacuum zone-melting method

水处理剂 2-羟基膦酰基乙酸（HPAA）
Water treatment chemicals:2-Hydroxyphosphonoacetic acid

北检院部分仪器展示

硅基氧化到羟基检测标准

硅基MEMS制造技术 氢氧化钾腐蚀工艺规范 Silicon-based MEMS fabrication technology - Specification for KOH etch process

气相二氧化硅表面硅羟基含量测试方法

Oxidation of MIB and Geosmin by Ozone and Hydroxyl Radicals Oxidation of MIB and Geosmin by Ozone and Hydroxyl Radicals

Intermediates of Cyanobacterial Toxins with Hydroxyl-Radical Based Advanced Oxidation Technologies (HR-AOTs) Intermediates of Cyanobacterial Toxins with Hydroxyl-Radical Based Advanced Oxidation Technologies (HR-AOTs)

Journal AWWA - Technical Note: Does Hydroxyl Radical Oxidize Bromide to Bromate Journal AWWA - Technical Note: Does Hydroxyl Radical Oxidize Bromide to Bromate

Water Quality Factors Affecting Hydroxyl Radicals and Bromate Formation During Ozonation Water Quality Factors Affecting Hydroxyl Radicals and Bromate Formation During Ozonation

Determination of the silanol group content on the surface of fumed silica — Reaction gas chromatographic method Determination of the silanol group content on the surface of fumed silica — Reaction gas chromatographic method

Standard Test Method for Hydroxyl Groups Using Reaction with Standard Test Method for Hydroxyl Groups Using Reaction with

硅基MEMS制造技术 体硅溶片工艺规范 Silicon-based MEMS fabrication technology - Specification for the dissolved wafer process

硅基MEMS制造技术 体硅压阻加工工艺规范 Silicon-based MEMS fabrication technology—Specification for criterion of the bulk silicon piezoresistance process

硅基压力传感器 Silicon-based pressure sensors

等离子喷涂羟基磷灰石涂层钛基牙种植体 Plasma sprayed hydroxyapatite coated titanium dental implant

水处理剂 2-羟基膦酰基乙酸(HPAA)

α,ω-二羟基聚二甲基硅氧烷线性体

硅基MEMS制造技术 版图设计基本规则 Silicon-based MEMS fabrication technology - The basic regulation of layout design

硅多晶气氛区熔基磷检验方法 Test method for phosphorus content in polycrystalline silicon by zone-melting method under controlled atmosphere

硅多晶真空区熔基硼检验方法 Test method for boron content in polycrystalline silicon by vacuum zone-melting method

水处理剂 2-羟基膦酰基乙酸（HPAA） Water treatment chemicals:2-Hydroxyphosphonoacetic acid

北检院部分仪器展示

硅基MEMS制造技术氢氧化钾腐蚀工艺规范
Silicon-based MEMS fabrication technology - Specification for KOH etch process

Oxidation of MIB and Geosmin by Ozone and Hydroxyl Radicals
Oxidation of MIB and Geosmin by Ozone and Hydroxyl Radicals

Intermediates of Cyanobacterial Toxins with Hydroxyl-Radical Based Advanced Oxidation Technologies (HR-AOTs)
Intermediates of Cyanobacterial Toxins with Hydroxyl-Radical Based Advanced Oxidation Technologies (HR-AOTs)

Journal AWWA - Technical Note: Does Hydroxyl Radical Oxidize Bromide to Bromate
Journal AWWA - Technical Note: Does Hydroxyl Radical Oxidize Bromide to Bromate

Water Quality Factors Affecting Hydroxyl Radicals and Bromate Formation During Ozonation
Water Quality Factors Affecting Hydroxyl Radicals and Bromate Formation During Ozonation

Determination of the silanol group content on the surface of fumed silica — Reaction gas chromatographic method
Determination of the silanol group content on the surface of fumed silica — Reaction gas chromatographic method

Standard Test Method for Hydroxyl Groups Using Reaction with
Standard Test Method for Hydroxyl Groups Using Reaction with

硅基MEMS制造技术体硅溶片工艺规范
Silicon-based MEMS fabrication technology - Specification for the dissolved wafer process

硅基MEMS制造技术体硅压阻加工工艺规范
Silicon-based MEMS fabrication technology—Specification for criterion of the bulk silicon piezoresistance process

硅基压力传感器
Silicon-based pressure sensors

等离子喷涂羟基磷灰石涂层钛基牙种植体
Plasma sprayed hydroxyapatite coated titanium dental implant

水处理剂　2-羟基膦酰基乙酸(HPAA)

硅基MEMS制造技术版图设计基本规则
Silicon-based MEMS fabrication technology - The basic regulation of layout design

硅多晶气氛区熔基磷检验方法
Test method for phosphorus content in polycrystalline silicon by zone-melting method under controlled atmosphere

硅多晶真空区熔基硼检验方法
Test method for boron content in polycrystalline silicon by vacuum zone-melting method

水处理剂 2-羟基膦酰基乙酸（HPAA）
Water treatment chemicals:2-Hydroxyphosphonoacetic acid