桉油含量等级检测标准
CNAS认证
CMA认证
GB/T 44971-2024
土壤硒含量等级
Soil selenium grade
- 【发布单位或类别】 CN-GB国家标准
- 【发布日期】2024-11-28
- 【CCS分类】B10土壤、肥料综合
- 【ICS分类】13.080.10土壤的化学特性
YS/T 935-2013
电子薄膜用高纯金属溅射靶材纯度等级及杂质含量分析和报告标准指南
Standard guide for analysis and reporting the impurity content and grade of high purity metallic sputtering targets for electronic thin film applications
- 【发布单位或类别】 CN-YS行业标准-有色金属
- 【发布日期】2013-10-17
- 【CCS分类】H68贵金属及其合金
- 【ICS分类】77.150.99其他有色金属产品
T/LFX 005-2023
无机肥料中氯离子含量等级 快速检测方法
- 【发布单位或类别】 CN-TUANTI团体标准
- 【发布日期】2023-06-30
- 【CCS分类】G化工
- 【ICS分类】65.080肥料
ISO 8875:1992
All grades of fluorspar — Determination of moisture content of a lot
All grades of fluorspar — Determination of moisture content of a lot
- 【发布单位或类别】 IX-ISO国际标准化组织
- 【发布日期】1992-12-03
- 【CCS分类】
- 【ICS分类】73.080非金属矿
ISO 4283:1993
All grades of fluorspar — Determination of carbonate content — Titrimetric method
All grades of fluorspar — Determination of carbonate content — Titrimetric method
- 【发布单位或类别】 IX-ISO国际标准化组织
- 【发布日期】1993-01-21
- 【CCS分类】
- 【ICS分类】73.080非金属矿
ISO 4283:1990
All grades of fluorspar — Determination of carbonate content — Titrimetric method
All grades of fluorspar — Determination of carbonate content — Titrimetric method
- 【发布单位或类别】 IX-ISO国际标准化组织
- 【发布日期】1990-06-07
- 【CCS分类】
- 【ICS分类】73.080非金属矿
ASTM F2113-01(2007)
Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications
Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications
- 【发布单位或类别】 US-ASTM美国材料与试验协会
- 【发布日期】2007-06-01
- 【CCS分类】
- 【ICS分类】29.045半导体材料
ASTM F2113-01(2011)
Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications (Withdrawn 2020)
Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications (Withdrawn 2020)
- 【发布单位或类别】 US-ASTM美国材料与试验协会
- 【发布日期】2011-06-01
- 【CCS分类】
- 【ICS分类】29.045半导体材料
ASTM F2113-01
Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications
Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications
- 【发布单位或类别】 US-ASTM美国材料与试验协会
- 【发布日期】2001-06-10
- 【CCS分类】
- 【ICS分类】半导体材料
ASTM F2113-01e1
Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications
Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications
- 【发布单位或类别】 US-ASTM美国材料与试验协会
- 【发布日期】2001-06-10
- 【CCS分类】
- 【ICS分类】29.045非金属矿
ISO 9505:1992
All grades of fluorspar — Determination of arsenic content — Silver diethyldithiocarbamate spectrometric method
All grades of fluorspar — Determination of arsenic content — Silver diethyldithiocarbamate spectrometric method
- 【发布单位或类别】 IX-ISO国际标准化组织
- 【发布日期】1992-01-23
- 【CCS分类】
- 【ICS分类】73.080
